Particle Measuring Systems Launches Chem 20 SM Counter
The new 20 nm particle counter is certified for hazardous-area solvent monitoring in industrial production environments.
Updated on Oct. 20, 2026 in Semiconductors
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Particle Measuring Systems has introduced the Chem 20 SM, a particle counter capable of detecting 20 nm contaminants in solvent chemistries. The device is designed specifically for hazardous-area installation without the need for nitrogen-purged enclosures.
Why it matters
By removing the requirement for secondary containment, the device simplifies deployment and reduces implementation costs. This enables manufacturers to monitor contamination closer to the production process to ensure higher yields.
The Chem 20 SM features a 20 nm particle detection threshold and supports continuous 24/7 monitoring of solvents like IPA and PGMEA. It complies with international safety benchmarks including IECEx, ATEX, and NFPA 70 NEC Class I Division 2 standards.
The players
Particle Measuring Systems
Particle Measuring Systems is a global company that specializes in particle monitoring and contamination control solutions for high-tech industries.
The details
The device utilizes a compact inline design that integrates both local and remote data access capabilities. Its architecture eliminates the need for nitrogen-purged enclosures, facilitating easier integration into existing production workflows.
Timeline
October 20, 2026: Particle Measuring Systems launched the Chem 20 SM.
The Tech Race
The development of the Chem 20 SM follows the safety protocols established by the NFPA 70 NEC Class I Division 2 standards to enable safe solvent monitoring. This shift reflects a broader industry movement toward simplifying cleanroom infrastructure by reducing reliance on bulky, nitrogen-purged enclosures.
Users can expect improved workflow efficiency due to the reduced need for complex enclosure systems during installation. The device enables 24/7 monitoring, providing real-time data access to help plant operators manage solvent purity remotely.
The takeaway
The Chem 20 SM marks a shift toward more compact and accessible hazardous-area monitoring tools. Manufacturers looking to optimize their cleanroom space should consider how integrating inline monitoring could decrease infrastructure overhead while maintaining strict contamination control.
Further reading
For more on industry advancements, visit the Semiconductors section.
Source note: This article includes information reported by Environmental XPRT.
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